Synopsys Inc. (SNPS) and Applied Materials Inc. (AMAT) announced a collaboration to develop technology computer-aided design or TCAD models for next-generation semiconductor devices.
The models derived from this TCAD collaboration will enable customers to speed up process development for 14-nanometer (nm) and 11-nm logic and new memory chip technologies, allowing them to lower cost and reduce time-to-market.
In this collaboration, Applied Materials will supply critical film properties and device characterization data from its advanced process systems to Synopsys, thereby enabling the development of models using Synopsys' Sentaurus TCAD tool suite.
The companies have also collaborated on calibrating multiple ion implant schemes and through-silicon via (TSV) development.
by RTT Staff Writer
For comments and feedback: email@example.com